By Margaret Huffman
Department of Chemical and Biomolecular Engineering
Landon Keller and Hannah Margavio, CBE Ph.D. students in the Parsons Lab, attended the AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022). This year’s three day meeting took place in Ghent, Belgium, and included over 800 attendees.
Landon and Hannah were nominated as student finalists, competed against other students and advanced to present to the entire conference. They both won Best Student Paper Award for their respective sections, Landon for the ALE section and Hannah for the ALD section. The Best Student Paper Award winner is determined by quality of research and clarity of presentation. It is a tremendous honor for NC State to take home the only two student awards at the conference.
Landon’s presentation was titled “Direct Integration of HfO2ALD and Surface Selective ALE for Controlled HfO2 Film Growth” and Hannah’s presentation was titled “Sacrificial Etching Kinetics Control Extent of Pattern Alignment in Area-Selective Atomic Layer Deposition (AS-ALD) via Simultaneous Deposition and Etching.”
Congratulations to Landon, Hannah and the Parsons Lab for leading the way at the conference!
This post was originally published in the Department of Chemical and Biomolecular Engineering.
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